TRY IT! Metrology in the Semiconductor Process

<body><table dir="ltr" border="0" cellpadding="0" cellspacing="0" width="100%"><tr><td valign="top"> <a href="index.html"></a> <a href="momentum.htm"></a> <a href="vision.htm"></a> <a href="questerapt.htm"></a> <a href="grid.htm"></a> <a href="semiproc.htm"></a> <a href="litho.htm"></a> <a href="stepvscan.htm"></a> <a href="apc.htm"></a> <a href="whycmp.htm"></a> <a href="PTI.htm"></a> <a href="pti_spanish.htm"></a> <a href="sealcheck.htm"></a> <a href="copper.htm"></a> <p>Metrology is used at many points in the production of semiconductors. Uses include the measurement of layers, the shape of the surface, the shape of specific devices, and defect detection in materials. Four different techniques are commonly used: Spectrophotometry, Ellipsometry, Opto-acoustics, and Scanning Tunneling Microscopy.</p> </td></tr></table><table border="0" cellpadding="0" cellspacing="0" width="100%"><tr><td> <p><font face="Arial" size="1">Copyright 1998-<span lang="en-us">2011</span> Qameleon Technology, Inc.</font> </p> </td></tr></table></body>